Moortec CEO Stephen Crosher will be presenting a talk entitled “The challenges posed by in-chip conditions to reaching working Silicon” at the forthcoming Design & Reuse IP SoC event in China.

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The presentation will focus on how embedded Process Monitors, Voltage Supply Monitors and Temperature Sensors can help address the challenges that arise during advanced node design especially as the node size decreases.

The Design & Reuse IP SoC China 2016 event is an opportunity to establish the right connection between innovators, IC developers, system houses to target promising applications as well as investors looking for success track.

The event is being held at the Evergreen Laurel Hotel Shanghai on Friday 2nd September.

https://www.design-reuse-embedded.com/ipsocdays/shanghai-program.jsp#

If you are attending the event, please visit the Moortec Booth to find out more about our range of embedded PVT monitoring IP on 28nm & FinFET. If you would like to arrange a meeting with Moortec while at the exhibition please contact ramsay.allen@moortec.com

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